<?xml version="1.0" encoding="US-ASCII"?>
<dblp>
<article key="journals/tie/JiaZWLML19" mdate="2025-02-25">
<author orcid="0000-0001-5628-6237">Wei Jia 0001</author>
<author orcid="0000-0002-4032-8049">Yang Zhao 0002</author>
<author orcid="0000-0003-0873-0465">Ronggang Wang</author>
<author>Shujie Li 0002</author>
<author orcid="0000-0002-6451-652X">Hai Min</author>
<author>Xiaoping Liu 0003</author>
<title>Are Recent SISR Techniques Suitable for Industrial Applications at Low Magnification?</title>
<pages>9828-9836</pages>
<year>2019</year>
<volume>66</volume>
<journal>IEEE Trans. Ind. Electron.</journal>
<number>12</number>
<ee>https://doi.org/10.1109/TIE.2018.2886792</ee>
<ee>https://www.wikidata.org/entity/Q128776674</ee>
<url>db/journals/tie/tie66.html#JiaZWLML19</url>
</article>
</dblp>
