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G. P. Patsis

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2000 – 2009

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2006
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  - journals/ijcse/PatsisNLG06
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G. P. Patsis, M. D. Nijkerk, L. H. A. Leunissen, E. Gogolides:
Simulation of material and processing effects on photoresist line-edge roughness. Int. J. Comput. Sci. Eng. 2(3/4): 134-143 (2006)
2005
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G. P. Patsis:
Monte Carlo study of surface and line-width roughness of resist film surfaces during dissolution. Math. Comput. Simul. 68(2): 145-156 (2005)

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