<?xml version="1.0" encoding="US-ASCII"?>
<dblp>
<inproceedings key="conf/eitce/ZhangHZJ023" mdate="2024-05-04">
<author orcid="0009-0007-7223-9634">Shiyu Zhang</author>
<author orcid="0000-0002-2793-3594">Dongqing Hu</author>
<author orcid="0000-0001-9926-947X">Xintian Zhou</author>
<author orcid="0009-0004-8340-3215">Yunpeng Jia</author>
<author orcid="0000-0002-5847-946X">Yu Wu 0015</author>
<title>Optimized Design of Trench Termination for High-Voltage &#946;-Ga2O3 Trench MOS Barrier Schottky Diode with Anode Electrode Extension.</title>
<pages>66-72</pages>
<year>2023</year>
<booktitle>EITCE</booktitle>
<ee>https://doi.org/10.1145/3650400.3650412</ee>
<crossref>conf/eitce/2023</crossref>
<url>db/conf/eitce/eitce2023.html#ZhangHZJ023</url>
</inproceedings>
</dblp>
