A new technique for evaluating stacked nanosheet inner spacer TDDB reliability.

Tian Shen Koji Watanabe Huimei Zhou Michael Belyansky Erin Stuckert Jingyun Zhang Andrew Greene Veeraraghavan S. Basker Miaomiao Wang 0006 A new technique for evaluating stacked nanosheet inner spacer TDDB reliability. 1-5 2020 IRPS https://doi.org/10.1109/IRPS45951.2020.9129258 conf/irps/2020 db/conf/irps/irps2020.html#ShenWZBSZGBW20