<?xml version="1.0" encoding="US-ASCII"?>
<dblp>
<article key="journals/ieiceee/OnoueMTS14" mdate="2025-05-31">
<author>Masatoshi Onoue</author>
<author orcid="0000-0003-1057-2072">Takaaki Miyasako</author>
<author>Eisuke Tokumitsu</author>
<author>Tatsuya Shimoda</author>
<title>Observation of high dielectric constant of Bi-Nb-O<sub>x</sub> thin-film capacitors fabricated by chemical solution deposition process.</title>
<pages>20140651</pages>
<year>2014</year>
<volume>11</volume>
<journal>IEICE Electron. Express</journal>
<number>16</number>
<ee type="oa">https://doi.org/10.1587/elex.11.20140651</ee>
<url>db/journals/ieiceee/ieiceee11.html#OnoueMTS14</url>
</article>
</dblp>
