AI Corrosion Control in Caustic Solutions
AI Corrosion Control in Caustic Solutions
ABSTRACT
I n aqueous solutions of 1-10M NaOH or K O H the corrosion of A1 can be
accelerated b y chemical p r o m o t e r s such as S = (or S H - ) ions a n d / o r b y a
t h e r m a l r u n a w a y mechanism, and inhibited b y surface a m a l g a m a t i o n , espe-
cially w i t h Z n O - s a t u r a t e d solutions, a n d / o r b y a l k y l d i m e t h y l b e n z y l a m m o n i u m
salts. Corrosion is also m a r k e d l y r e d u c e d at high anodic c u r r e n t densities.
T h e u s e of A1 a n o d e s in a l k a l i n e p r i m a r y b a t t e r i e s ,
as d i s c u s s e d in a n e a r l i e r p a p e r ( 1 ) , d e p e n d s in l a r g e ~ VOLUME0:" Hz FO~MEL,
p a r t on a d e q u a t e c o r r o s i o n control. T h e p r e s e n t
s t u d i e s d e a l first w i t h t h e a c c e l e r a t i o n a n d t h e n
m a i n l y w i t h t h e i n h i b i t i o n of A1 c o r r o s i o n in a q u e -
ous s o l u t i o n s c o n t a i n i n g 1-10M N a O H or K O H .
Experimental Procedure
T h e e x p e r i m e n t s w e r e p e r f o r m e d at r o o m t e m - 57~'/.0
p e r a t u r e w i t h s t a n d a r d s t r i p s of 10 c m 2 t o t a l s u r f a c e
a r e a A1 g r a d e 1145 c o n t a i n i n g a t l e a s t 99.45% A1,
--~0.55% ( S i + F e ) , ~ 0 . 2 0 % Mn, a n d ~ 0 . 0 9 % o t h e r
i m p u r i t i e s . F o r q u i c k c o m p a r a t i v e tests, s e v e r a l
C r a i g cells (2), m o d i f i e d as s h o w n in Fig. 1, w e r e
u s e d to r e a d d i r e c t l y t h e v o l u m e of H2 f o r m e d b y
the corrosion reaction
3
A1 W 3HeO -t- O H - --> A I ( O H ) 4 _ -t- --~-H2 [1] Fig. 1. Modified Craig cell for comparative corrosion tests
as a f u n c t i o n of t i m e of i m m e r s i o n in t h e t e s t e d T h e c o r r o s i o n r a t e as a f u n c t i o n of a n o d e c u r r e n t
solution. T h e s e r e a d i n g s w e r e c o n v e r t e d b o t h into density was measured with the apparatus shown
a v e r a g e r a t e of c o n s u m p t i o n of A1 a n d a v e r a g e l o c a l s c h e m a t i c a l l y in Fig. 2. T w o p o r o u s Ni a i r c a t h o d e s
a c t i o n c o r r o s i o n c u r r e n t b y m e a n s of t h e c o n v e r s i o n m o u n t e d on thin, flat, solid Ni f r a m e s w e r e c l a m p e d
f a c t o r s : 1 cc H2 at 3 0 0 ~ a n d 1 a t m / 1 0 cm2-sec is b e t w e e n r u b b e r g a s k e t s a n d glass flats on e a c h side
e q u i v a l e n t to 2.71 x 10 -5 c m (or 0.271~) A1 r e a c t e d / of a v e r t i c a l s u r f a c e - a m a l g a m a t e d A1 a n o d e s t r i p
sec or 785 m a / c m 2, i.e., 1~ A 1 / h r is e q u i v a l e n t to h e l d f i r m l y at t h e l o w e r ( s h o r t e r ) e d g e b e t w e e n a n
0.805 m a / c m ~. F e n a i l a n d a glass t u b e p a s s i n g t h r o u g h a r u b b e r
1 Present address: Corning Glass Works, Bradford, Pennsylvania. s t o p p e r . A s h a l l o w p o o l of H g j u s t a b o v e t h e s t o p p e r
e Present address: Radio Corporation of A m e r i c a , Moorestown, assured continued anode surface amalgamation and
N e w Jersey.
s a t i s f a c t o r y e l e c t r i c a l c o n t a c t b e t w e e n t h e A1 a n d
~9 P r e s e n t a d d r e s s : R e s e a r c h a n d C o n s u l t i n g C o r p o r a t i o n , 1125 E a s t
102 S t r e e t , B r o o k l y n 36, N e w Y o r k . t h e F e nail. W i t h t h e c a t h o d e s c o n n e c t e d in p a r a l l e l ,
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268 JOURNAL OF THE ELECTROCHEMICAL SOCIETY A p r i l 1963
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Vol. 110, No. 4 A1 C O R R O S I O N IN CAUSTIC SOLUTIONS 269
Table I. Typical average rates of corrosion of AI (Grade 1145) in alkaline solutions at room temperature
A v g c o r r o s i o n r a t e ( / ~ h r ) i n 3M s o l u t i o n s o f
KOI-I NaOI'~
Set Plain Amalgamated Plain Amalgamated
No. Additive AI A1 A1 A1
w e a k e n i n g of t h i s l a y e r b y a m a l g a m a t i o n is o u t - w h i c h t h e n b e c o m e s t h e r a t e - l i m i t i n g s t e p in t h e
weighed by the Hg-induced increase in overvoltage corrosion mechanism.
f o r t h e He e v o l u t i o n r e a c t i o n U n f o r t u n a t e l y , a m a l g a m a t i o n of A1 p r e s e n t s s e v -
e r a l p r a c t i c a l d i s a d v a n t a g e s . L a c k of r e p r o d u c i b i l i t y
1 would result from improper amalgamation (the best
H 2 0 + e - -* O H - + -~- H2 [3]
p r o c e d u r e c o n s i s t i n g of p r e - e t c h i n g t h e A1 i n 10M
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270 JOURNAL OF THE ELECTROCHEMICAL SOCIETY A p r i l 1963
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VoI. 110, No. 4 A1 C O R R O S I O N I N C A U S T I C S O L U T I O N S 271
3. W. M. Latimer and J. H. Hildebrand, "Reference A. G. Gray, Editor, John Wiley & Sons, Inc., New
Book of Inorganic Chemistry," Macmillan Co., York (1953).
New York (1950). 5. Yoshihiro Hisamatsu, J. E l e c t r o c h e m . Soc. ( J a p a n ) ,
4. F. Keller in "Modern Electroplating," pp. 514-517, 27, E73-75 (1959).
Correction
In the papers "Theory and Design Principles of the (2n + 1)~x
e-c2n + z)2v2D~'/4a 2 sin [42]
Reversible Electroplating Light Modulator" and 2a
"Geometric Requirements for Uniform Current Den-
sities at Surface-Conductive Insulators or Resistive The last line of footnote 4 should read:
Electrodes" by Solomon Zaromb, published in Vol. i n C a n d j,s Eq. w (2), a n d a d d i n g + c~.
109, pp. 903-918, October 1962 JournaL, the following The line preceding Eq. [50] should read:
changes should be made:
[42], results in a solution of the form 5
p. 908, Eq. (V') should read
( 3 ) and Eq. [50'] is
~-Is-+Ag +---~I- ~(3I-+Ag+)~AgI3 = (V')
L Fa aWL Fa "~
P a g e 909: B o u n d a r y condition [40'] is:
an amount q a / F injected at x = a and tp = ~-~ [40'] -b "' 1 -- ~ e-~2Dtp'/4a 2 sin 2a [50']
qr
Eq. [42] is:
cox(x, tp') = Page 910, column 2, Eq. [50'"'] is
ABSTRACT
The absorption coefficient and transmission of vacuum deposited films of
SiO were used as a measure of the reproducibility of the relative composition
of the resulting films. The optical properties of the films can be reproduced
by controlling the evaporation rate and partial pressure of oxygen. Repro-
ducibility of optical properties does not insure reproducible electrical prop-
erties since the surface condition of the electrode material greatly affects the
electrical properties.
Recently, SiO has received considerable attention on condensation the compound probably dispropor-
in the fabrication of thin films by v a c u u m evapora- tionates according to the following reaction
tion technique due to its low vapor pressure, rela-
tive chemical inertness, sublimation of bulk m a t e - 2Si0-~ Si + Si02
rial, and flexibility of boat design. V a c u u m deposited
thin films of SiO have been widely used in the The condensed material obtained for the experi-
areas of optical coatings, encapsulation of electrical ments to be discussed varied in composition depend-
and optical devices, and as an insulator or dielectric ing on conditions of preparation. As would be ex-
in thin film electrical devices. pected, this variation in composition greatly affected
Although this material has found wide applica- the optical and electrical properties of the thin films.
tion in the thin film area, there is a question con- The purpose of this investigation was to study
cerning the existence of a true chemical compound the influence of the partial pressure of oxygen and
SiO in the solid state (1-13). It has been established the evaporation rate of the SiO and to relate these
that SiO does exist in the gas phase (7-8) whereas findings to their optical and electrical properties.
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