3T XOR Gate Design
3T XOR Gate Design
Shiwani Singh
1
Electronics and Communication Department
SRMS CET, Bareilly
E-mail: [email protected]
The design shown in Fig.1 [2]-[6] is based on a modified version of a CMOS inverter
and a pMOS pass transistor. When the input B is at logic high, the inverter functions
like a normal CMOS inverter. When the input B is at logic low, the CMOS inverter
output is at high impedance. However, the pass transistor M3 is enabled and the output
Y gets the same logic value as input A. However, when A=1 and B=0, voltage
degradation due to threshold drop occurs across transistor M3 and consequently the
output Y is degraded with respect to the input. The voltage degradation due to
threshold drop can be considerably minimized by increasing the W/L ratio of transistor
M3 [7]. Table I illustrates the performance in terms of obtained output at various input
combinations.
The design of proposed XOR gate is shown in Fig. 2. It consists of three pMOS
transistors and an input voltage of (-440)mV is given to M3. Due to this input voltage,
M3 remains ON. The substrate terminals of all the transistors are connected to
respective source terminal in order to nullify the substrate bias effect.
When AB=00, all transistors are ON and as pMOS is weak ‘0’ device, it will pass low
logic signal with threshold loss. When AB=01, M1 is ON and pMOS being strong ‘1’
device will pass complete logic high at the output but as M3 is always ON, so due to
parallel resistance of both the devices the output will be slightly degraded than logic ‘1’
and similar case will happen with AB =10. The W/L ratios of transistors M1and M2
are increased up to 3/1 in order to minimize the threshold loss of M3[7].
For AB=11, only M3 is ON and it will pass incomplete logic ‘0’ signal at the output
port.
Table I. Performance Table of Existing and Proposed 3T XOR Cell
Expected Output Obtained Output (Volt)
A (Volt) B (Volt)
(Volt) Existing Proposed
0 0 0 -0.13 0.09
0 1 1 0.99 0.83
1 0 1 0.76 0.83
1 1 0 0 0.09
The performance table shown in Table I illustrates that the small degradation in the
output voltage with respect to the full scale input voltage value which can be easily
interpreted as logic ‘1’. This proposed design for XOR gate gives better performance
than existing one.
V. Conclusion
The pre layout simulations of both the designs have been done and studied using 45nm
technology. The proposed design shows improved logic levels at certain input
combinations. The proposed XOR gate also has improved power consumption with
respect to various parameters. Hence, the proposed gate can be used for various
applications like adder, multiplier and other complex designs.
References
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