Phase-out AZ5214E
EU version
Photoresist comparison POSITIVE processing
February 4, 2021
Wiesbaden
Phase-out AZ5214E Content
EU version Photoresist comparison POSITIVE processing
1. Spin curve comparison
2. Process parameters
3. Exposure Latitude
4. Linearity
5. Focus Latitude
2 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E
Spin Curve comparison
EU version
film thickness /µm Spin curves
spin speed
AZ 5214E [EU] vs. AZ 5214E [JP]
/RPM AZ 5214E [EU] AZ 5214E [JP] 5.00
500 4.32* 4.06* 4.50
4.00
film thickness /µm
1000 3.12 2.93
3.50
2000 2.18 2.06
AZ 5214E [EU]
3.00
AZ 5214E [JP]
3000 1.77 1.67 2.50
4000 1.53 1.44 2.00
1.50
5000 1.37 1.29
1.00
0 1000 2000 3000 4000 5000 6000 7000
6000 1.26 1.18 spin speed /RPM
* no ideal coating at this speed
3 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E Process Parameters
EU version positive processing
AZ 5214E [EU] AZ 5214E [JP]
Substrate 6'' bare silicon (HMDS prime)
Photoresist name AZ 5214E [EU] AZ 5214E [JP]
Film thickness 1.422 µm
RPM 4610 4182
Softbake 105°C / 60 s
Exposure Tool Nikon i-line Stepper
96.02 mJ/cm² 118.59 mJ/cm²
Dose to print
@ L / S: 1.00 µm
Developer name AZ 726 MIF
Developing condition 1 x 60 s
4 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E
Exposure Latitude
EU version
Exposure Latitude (pos. mode)
AZ 5214E [EU] vs. AZ 5214E [JP]
1.12
1.08
1.04
CD Mask / µm
1.00
AZ 5214E [EU]
0.96
AZ 5214E [JP]
0.92
0.88
70 95 120 145
Exposure / mJ/cm2
5 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E Exposure Latitude
EU version positive processing
Exposure: 87 mJ/cm² Exposure: 95 mJ/cm² Exposure: 103 mJ/cm² Exposure: 108 mJ/cm² Exposure: 113 mJ/cm²
CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm
AZ 5214E
[EU]
Exposure: 105 mJ/cm² Exposure: 120 mJ/cm² Exposure: 125 mJ/cm² Exposure: 133 mJ/cm² Exposure: 138 mJ/cm²
CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm CD: 1.00 µm
AZ 5214E
[JP]
6 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E
Linearity
EU version
Linearity (pos. mode)
AZ 5214E [EU] vs. AZ 5214E [JP]
2.00
1.80
1.60
CD Resist / µm
1.40
1.20
1.00
AZ 5214E [EU]
0.80 AZ 5214E [JP]
0.60
0.60 0.80 1.00 1.20 1.40 1.60 1.80 2.00
CD Mask / µm
7 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E Linearity
EU version positive processing
CD: 0.55 µm CD: 0.60 µm CD: 0.65 µm CD: 0.70 µm CD: 0.75 µm
Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm²
AZ 5214E
[EU]
CD: 0.55 µm CD: 0.60 µm CD: 0.65 µm CD: 0.70 µm CD: 0.75 µm
Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm²
AZ 5214E
[JP]
8 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E Linearity
EU version positive processing
CD: 0.80 µm CD: 0.90 µm CD: 1.00 µm CD: 1.10 µm CD: 1.20 µm
Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm²
AZ 5214E
[EU]
CD: 0.80 µm CD: 0.90 µm CD: 1.00 µm CD: 1.10 µm CD: 1.20 µm
Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm²
AZ 5214E
[JP]
9 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E Linearity
EU version positive processing
CD: 1.30 µm CD: 1.40 µm CD: 1.50 µm CD: 2.00 µm CD: 3.00 µm
Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm²
AZ 5214E
[EU]
CD: 1.30 µm CD: 1.40 µm CD: 1.50 µm CD: 2.00 µm CD: 3.00 µm
Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm²
AZ 5214E
[JP]
10 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E
Focus Latitude
EU version
Focus Latitude (pos. mode)
AZ 5214E [EU] vs. AZ 5214E [JP]
1.16
1.12
1.08
1.04
CD Mask / µm
1.00
0.96 AZ 5214E [EU]
AZ 5214E [JP]
0.92
0.88
0.84
-2.10 -1.90 -1.70 -1.50 -1.30 -1.10 -0.90 -0.70 -0.50 -0.30 -0.10 0.10 0.30
Focus / µm
11 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E Focus Latitude
EU version positive processing
Focus: -1.9 µm Focus: -1.5 µm Focus: -1.1 µm Focus: -0.5 µm Focus: -0.1 µm
Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm² Exposure: 95 mJ/cm²
AZ 5214E
[EU]
Focus: -1.9 µm Focus: -1.5 µm Focus: -1.1 µm Focus: -0.5 µm Focus: -0.1 µm
Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm² Exposure: 120 mJ/cm²
AZ 5214E
[JP]
12 04.02.2021 Phase-out AZ5214E EU version
Disclaimer
Products are warranted to meet the specifications set forth on their label/packaging and/or certificate of
analysis at the time of shipment or for the expressly stated duration. All sales are subject to Merck’s
complete Terms and Conditions of Sale. Prices are subject to change without notice. We reserves the right
to discontinue products without prior notice.
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13 04.02.2021 Phase-out AZ5214E EU version
