Embedded DRAM Using C-Axis-Aligned Crystalline In-Ga-Zn Oxide FET With 1.8V-Power-Supply Voltage
Embedded DRAM Using C-Axis-Aligned Crystalline In-Ga-Zn Oxide FET With 1.8V-Power-Supply Voltage
Eri Yamamoto, Seiya Saito, Keita Sato, Kazuma Furutani, Yuto Yakubo, Tatsuya Onuki,
Takanori Matsuzaki, Tomoaki Atsumi, Yoshinori Ando, Tsutomu Murakawa,
Kiyoshi Kato and Shunpei Yamazaki
Introduction
The progress of IoT system has rapidly increased in the number of sensor nodes, which
causes an issue of an exponential increase in power consumed by data transmission from
the sensors to a server. In addition, prompt access to stored data is required. To solve this
issue, there has been a rising demand for memory as edge devices closer to sensor
terminals (edge-computing memory). The edge-computing memory that stores data
requires low stand-by power (1).
Typical low-power memory includes memories using c-axis aligned crystalline In-
Ga-Zn Oxide (CAAC-IGZO) field-effect transistors (FETs) (214) that have been widely
adopted for the display field (1517). The CAAC-IGZO FETs have an extremely low
off-state current on the order of yoctoamperes per micrometer (yAm) (yocto- is a
metric prefix denoting a factor of 10-24) (2, 17, 1824), and their back gates enable the
control of threshold voltage (25). Scaled CAAC-IGZO FETs to 20 nm have been reported
(26, 27). A dynamic oxide semiconductor random access memory (DOSRAM), where
CAAC-IGZO FETs are used as access transistors in DRAM cells (37), enables long data
retention and long intervals between refresh operations, resulting in low stand-by power
(4, 5).
This work shows the power-supply voltage of DOSRAM for edge computing, which
enables low stand-by power, based on measurement results of 64-kb DOSRAM
fabricated with a process combined with 60-nm CAAC-IGZO FETs and 65-nm Si CMOS
and simulation results of DOSRAM and a negative-voltage generator that uses CAAC-
IGZO FETs and supplies a negative voltage to a word line.
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ECS Transactions, 90 (1) 139-146 (2019)
Figure 1 shows back-gate voltage (Vbg) dependence of top gate-drain current (Vg-Ids)
performance of 60-nm CAAC-IGZO FETs, and their Vbg dependence of threshold voltage
(Vth) is shown in Fig. 2. The threshold voltage (Vth) of the CAAC-IGZO FET is
controlled by changing a level of Vbg, whereas Vth of the Si FET is controlled by channel
doping. As shown in Fig. 2, Vth can be controlled to range from 0 to 1.6 V with Vbg
ranging from 0 to 12 V. One of features of the CAAC-IGZO FET is an extremely low
off-state current which allows a high ratio between on-state current (Ion) and off-state
current (Ioff).
0.0001-4
10
L = 60nm
0.0000
10-5 W = 60nm
0.0000-6
10 Vd = 1.2V
T = R.T.
0.0000-7
10
Ids [A]
0.0000-8
10 Vbg = 0 V -12 V
0.0000-9
10
0.0000
-10
10
0.0000
10-11
0.0000
10-12
-2 -1.5 -1 -0.5 0 0.5 1 1.5 2 2.5 3 3.5
Vg [V]
1.8
1.6
1.4
1.2
1
Vth [V]
0.8
0.6
0.4 L = 60nm
W = 60nm
0.2
Vd = 1.2V
0 T = R.T.
-0.2
-12-11-10 -9 -8 -7 -6 -5 -4 -3 -2 -1 0
Vbg [V]
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ECS Transactions, 90 (1) 139-146 (2019)
Our prototyped 64-Kb DOSRAM is composed of four 16-Kb subarrays each consisting
of 16 1-Kb local arrays as shown in Fig. 3. As each local array, a DOSRAM cell array
with open bit line architecture, where 8 DOSRAM cells are connected to a bit line and
128 DOSRAM cells are connected to one word line, is located on a sense amplifier array.
The cell capacitance is 3.5 fF, and the cell size is 3.696 m2. The high voltage and low
voltage (VDD and VSS) for a logic circuit such as a sense amplifier are respectively 1.2 V
and 0.0 V. The high voltage and low voltage for the word line (VDDH and VSSL) are
variable.
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ECS Transactions, 90 (1) 139-146 (2019)
-2.0
Vbg [V]
-3.0
Condition2
-4.0
PASS
-5.0
-6.0
FAIL Condition3
-7.0
*Pass means the existence of bit (at a rate less than 1) where write data and read data do not match
each other (NGbit) even for one out of ten types of test patterns.
Figure 4. Memory operation dependence on word line voltages (VDDHVSSL) and Vbg.
Power consumption of the negative-voltage generator was estimated with the following
two conditions: VDDHVSSLVbg 1.8 V-1.5 V0 V (Condition 1) and 2.5 V0.8 V3 V
(Condition 2). The conditions were set in terms of a reduction in power-supply voltage.
Figure 5 shows a block diagram of a negative-voltage generator used for simulation.
Each of the negative-voltage generators for the word line and the back gate are composed
of a ring oscillator, a charge pump, and a comparator. The ring oscillator and the charge
pump operate intermittently in accordance with output from the comparator.
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ECS Transactions, 90 (1) 139-146 (2019)
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ECS Transactions, 90 (1) 139-146 (2019)
Conclusion
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ECS Transactions, 90 (1) 139-146 (2019)
467 μm
811 μm
16Kb
64 Kb
Photo1. Micrograph of 64-Kb memory macro prototyped with hybrid process of 60-nm
CAAC-IGZO FET and 65-nm Si CMOS.
References
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ECS Transactions, 90 (1) 139-146 (2019)
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