6-Integrated Ferroelectric Monomorph Transducers For Acoustic Imaging
6-Integrated Ferroelectric Monomorph Transducers For Acoustic Imaging
Integrated Ferroelectrics: An
International Journal
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Intvy,orcd Fwrovkwtrics. 1997. Vol. 15, pp. 289- 307 C I997 OPA (Overseas Publishers Association)
Reprints available directly from the publisher Amsterdam B.V. Published in The Netherlands
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INTRODUCTION
Acoustic imaging in the I-MHz to 10-MHz range is currently carried out using
phased arrays of ferroelectric transducers. Medical ultrasound arrays are usually
limited to one-dimensional (linear) configurations due to limits on signal processing
and the large number of signal channels required by a dense 2-dimensional array.
However, 2-dimensional arrays are required to image 3-dimensional domains
without mechanical scanning.
This paper reports the use of micromachining technology combined with
advanced sol-gel PZT deposition to create 2-dimensional arrays of MHz acoustic
156311289
290/[564] J.J. BERNSTEIN et al.
transducers on silicon wafers. These transducers can be used with acoustic lenses
or phased arrays. Individual transducers have been used with an acoustic lens to
form high-resolution demonstration images. Potential applications of such arrays
include a hand-held diver’s sonar, medical ultrasound imaging, and nondestructive
testing (NDT).
Audio-frequency micromachined condenser hydrophones have been built and
demonstrated previously with on-chip J E T buffer amplifiers.l-2 These transducers
demonstrated a high sensitivity of (-177 dB // lV/pPa, 600 Hz to 6 kHz) and low
noise (Sea State Zero + 2 dB). Previous work on miniature ultrasonic transducers
on silicon used films of PVDF as the transduction material.3 Micromachining has
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been used to reduce crosstalk and to reduce stray capacitance on these PVDF
sense elements.415
The ultimate advantage of forming transducer arrays in silicon is that some of
the electronics could be fabricated integrally with the transducers. In mass
production, a merged microelectronic and sensor technology could yield high-
resolution sonar arrays at a lower cost than a hybrid assembly. In particular, the
problem of connecting a large number of individual elements may be best solved by a
monolithic switching network, forming the acoustic analog of an optical CCD or infra-
red array. The alternative is some form of bump bonding to a luge electronics array.
In the sections that follow, we will detail the design, fabrication, techniques, test
results, and acoustic images for these first-generation micromachined ultrasonic
transducers.
TRANSDUCER ANALYSIS
A drawing of a PZT on silicon monomorph device is shown in Figure 1. Square and
rectangular silicon diaphragms of controlled thickness between 1 and 20 pm can be
conveniently etched in single-crystal silicon wafers by standard micromachining
techniques. A drawing of an array of various size transducers is shown in Figure 2.
Dielectric insulation layers and a metal/PZT/metal capacitor are: deposited to form a
monomorph centered on the square diaphragms. The transducer cross section
contains, from top to bottom, Pt, Ti, PZT, Pt, Ti, Si02, and Si.
The most common sonar transducer shapes are ceramic: cylinders, spheres,
rectangular bars, and bimorphs. Of these shapes, the bimorph (or monomorph) most
easily adapts to thin-film fabrication and silicon micromachining. The bimorph is
FERROELECTRIC MONOMORPH TRANSDUCERS (565]/29
1
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in terms of the maximum allowable shear stress GMAX,the membrane side length a
and the thickness h, as
In calculating the burst pressure, layers other than silicon are neglected, since
ceramics are weak in tension. This conservative estimate of burst pressure vs
silicon diaphragm size and thickness is plotted in Figure 3.
loo 1 -
Y
--is- 20pThck
5pThick
15pThick
I ! I I I I
The small size of the diaphragms gives these transducers high burst strengths
of approximately 10 MPa (100 atm or I km of water for a 0.36 mm X 15 pm thick
diaphragm). This static pressure capability is adequate for many underwater
applications.
I s's
All the devices fabricated for this study used a square or rectangular membrane as
the sensing element, due to the constraints of anisotropic etching in diamond-cubic
silicon. New fabrication techniques (such as through-wafer plasma etching) allow
the fabrication of circular devices, whose greater symmetry should improve
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performance and burst strength. The circular bimorph is briefly analyzed here as the
prototypical bimorph system. Simple analytical formulae are available for the
resonant frequency, output sensitivity and capacitance.8 By studying the scaling
behavior of the circular bimorph, important conclusions can be drawn about the
effects of transducer size and water loading that are valid for the square
monomorphs. The series connected bimorph is assumed to have twice the
sensitivity and half the output capacitance of an equivalent monomorph of the same
total thickness and diameter.
The resonant frequency of a simply supported circular plate of thickness t and
radius a, with one-sided water loading is9
f = O.24341("U PH 0 a
ppn 1+0.77--L-
Pa7
In the absence of water loading, the simply supported case reduces to:
The resonant frequency of a clamped edge circular plate with one-sided loading
is:
294/[568] J.J. BERNSTEIN el al.
f =os+a
(5)
The resonant frequency of a clamped square plate of sidle length a, wetted on
one side is?
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Figure 4 shows the thickness vs diameter to achieve I-MHz resonance for the
simply supported and clamped, dry and one-side wetted circular transducers using
E~Z= T 69 X 109 Pa and PPZT = 7.7 X 103 kg/m3. The effect of water loading is to
raise the effective mass per unit area, which requires a thicker plate to bring the
resonant frequency back to 1 MHz.
30
c
P
0
10
E
5i
2ma2
The capacitance of the monomorph is C = t . Note that in the dry case,
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t
a . Both the output capacitance and the
the resonant frequency is proportional to 7
low-frequency sensitivity of the transducer are also determined by this ratio. In
other words, once the resonant frequency is chosen, the sensitivity and output
capacitance of the dry bimorph transducer are also determined. To first order, the
size of the unloaded element is unimportant. In contrast, the loaded transducer
sensitivity increases with diameter, since the larger, thicker elements are less
affected by water loading. The burst pressure also increases with size, since it is
t2
proportional to 2 . A plot of sensitivity vs diameter for a simply supported
monomorph transducer is shown in Figure 5. The dry transducer sensitivity is
shown for reference.
-
rA
-236 I I I I 1 I I
Finite-Element Analvsis
Due to the complexity of the multiple layer transducer, extensive use was made of
finite-element analysis (FEA). FEA was used to predict resonant frequency vs
thickness and diameter for various square and rectangular shaped diaphragms. The
hydrophones were modeled using 3-dimensional continuum solid elements. Three
layers of elements were used for the silicon and the PZT layers.
Radiation impedance (fluid loading) is very important since the radiation mass
of the surrounding fluid is larger than the diaphragm mass. Hence, both the Q and
the resonant frequency are strongly affected by the fluid loadin,gboundary conditions,
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including waterproof urethane coatings and air or fluid backing. The effect of the fluid
is approximated by applying added mass to the wetted surface. The added mass
was modeled by changing the density of the top FEA diaphragm layer.
Stress distributions were calculated by FEA using a 1-Pa load on the
diaphragms. The PZT produces an output electric field through its thickness
proportional to g31(bxx + oyy>, where g31 is the piezoelectric coefficient and oxx
and oYyare the in-plane stresses in the PZT layer. The output voltage is obtained
by integrating through the z (thickness) direction and taking an area average over
the electroded portion of the diaphragm.
FEA predicts that square transducers (295 pm X 295 pin) made with films of
PZT 5 pm thick on a silicon diaphragm 10 pm thick have a stat'ic sensitivity of -234
dB // lV/pPa. Due to the small mass of the diaphragm and the efficient coupling to
water, the mechanical Q of these devices is expected to be on the order of 4. The
low Q makes possible operation over a broad frequency range. Operation at the
fundamental resonant frequency should give enhanced sensitivity by a factor of Q,
raising the sensitivity as high as -222 dB // lV/pPa. Initial test results on
transducers with a 3.5-ym layer of PZT showed a sensitivity at 1 MHz of -225 dB //
1 V/pPa in silicone oil, close to theoretical predictions. Encapsulation in
polyurethane reduced the sensitivity to -244 dB // lV/pPa due to adding mass and
stiffness.
Table I summarizes the calculated results for several transducer designs. In
the first fabrication phase, an array of 14 different sized square and rectangular
transducers (Figure 2) was fabricated to experimentally determine the optimum size
for sensing at various frequencies. Currently 8 X 8 arrays of identical transducers
are being fabricated for use as acoustic retinas.
FERROELECTRIC MONOMORPH 1 RANSDL'CERS [57 1]/?97
TRANSDUCER FABRICATION
Standard silicon micromachining techniques were used to fabricate the transducers,
as illustrated in Figure 6. Fabrication starts with double-side polished, 3-in
diameter n-type silicon wafers. The wafers were oxidized and photolithographically
patterned, leaving oxide only on the wafer backs where cavities are to be etched
later. A 5 or 10 pm thick boron-doped etch stop layer is then diffused into the silicon.
After the boron diffusion, all remaining Si02 is removed, and a low-
temperature oxide (LTO)is deposited. Back side holes are opened in the oxide (to
define the cavities) and alignment marks are etched on the wafer fronts using an
infrared mask aligner. Next, the cavities are etched in EDP (ethylenediamine-
pyrocatechol-water-pyrazine), leaving the heavily boron-doped silicon membranes.
EDP is an anisotropic etch that etch-stops on the silicon < 1 1 b planes and also
stops on heavily boron doped silicon. Bottom electrode metal layers (500 A Ti13000
A Pt) are then deposited on the wafer front surface. Note that the membranes are
strong enough to survive all subsequent processing without breakage.
The wafers are then coated with PZT (this process is described in the PZT
section). After PZT deposition the PZT is wet-etched using a photoresist mask.
The wafers are then sputter coated with a second Ti-Pt metal layer, which is
patterned with a photoresist lift-off process. The wafers are then diced into arrays
using a dicing saw.
298/[572] J.J. BERNSTEIN et al.
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titanium for adhesion, and 3000 A platinum) by a spin-on process. The films are
dried at 15OoC to evaporate the solvent, and then rapidly heated to 400°C to remove
the residual organics. This was followed by preannealing at 600OC to densify the
layer to prevent further shrinkage. This procedure is continued until films of the
desired thickness are built. The films were finally annealed at 70O0Cfor 1 hour. The
thickness of the films varies linearly with the number of layers, each layer
corresponding to a thickness of 0.25 pm.
Titaniudplatinum top electrodes 0.8 and 1.6 mm in diameter were used on
2.54-cm test wafers to measure the dielectric, ferroelectric, and piezoelectric
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properties. There were no electrical shorts in any of these test structures. These
properties are listed in Table II for a film that is 4 pm thick. The weak field dielectric
permittivity of the film at 1 kHz is 1400, with low dissipation losses of 3%. The
hysteresis loop for the 4 pm thick film is shown in Figure 7, testifying to high
remanent polarization and low coercive field. Electric field-induced displacements of
the films were measured using a double beam laser interferometer. Longitudinal
piezoelectric coefficient, d33, obtained from the slope of 8 plot of the strain vs the
applied electric field is 246 pCM. X-ray diffraction data indicate a strong (100)
orientation for PZT films greater than 5 km thick.
In summary, PZT films up to 12 pm in thickness have been fabricated by
extending and modifying the sol-gel precursor chemistry, and the thermal treatment.
This is a distinct advance over the previous film processing techniques that were
limited to thicknesses less than 1 pm. The electrophysical properties of the films
match that of the bulk ceramic, and perform extremely well as sonar transducers, as
evident in the following sections
S - E T
In this section, we will tabulate characteristics of the various transducers fabricated,
and present results of frequency response and horizontal and vertical beam patterns.
FERROELECTRIC MONOMORPH TRANSDUCERS [575]/301
An underwater image taken by scanning a single transducer through the focal plane
of an acoustic lens will also be shown.
Fourteen different devices were fabricated using the first pask set. These
were square diaphragms ranging from 200 pm to 1 mm on a side, and 2 mm long
rectangular diaphragms ranging from 140 pm wide to 300 pm wide. The dimensions,
sense area, stray capacitance area (bond pad and interconnect line), fraction of
useful area, sense capacitance values, and measured beamwidths are tabulated in
Table III.
The true open-circuit sensitivity can be obtained from the measured sensitivity
by correcting for the on-chip and off-chip stray capacitance, including cables and
preamplifier. For the 260 jun X 260 pm device, the useful 95 pF is loaded by on-chip
and off-chip strays totaling 145 pF. The open-circuit sensitivity is estimated to be 8
dB higher than the measured sensitivity, or -237 dB N IV/pPa. Throughout this
paper, the sensitivities quoted are raw data not corrected for the effects of stray
capacitance.
302/[576] J.J. BERNSTEIN eta/.
Freauen cv ResDonse
Resonant frequency can easily be measured in air using a network analyzer,
however, the resonant frequency in water is very difficult to measure. The loading
effects of urethane and water shift the resonant frequency down and reduce the Q
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drastically.
Frequency response was measured in a 4-ft X 4-ft X 12-ft water test tank
using a calibrated NRL USRD type E8 reference hydrophone. Two projectors were
used, a Panametrics V395 (2.25 MHz, 1.5-in diameter, unfocused) and a
Panametrics V304 (2.25 MHz, l-in diameter, unfocused). The source to sensor
distance was maintained at 2.0 m to ensure far-field operation at all frequencies.
For sensitivity tests, sinusoidal acoustic pulses of 100 ps duration, varying in
frequency between 300 kHz and 3 MHz, were generated in a waveform synthesizer
and amplified to approximately 500 V peak by an EN1 Model AP-400B power
amplifier prior to the projector. When received at the hydrophone, the signal was
amplified by a custom preamplifier (23 dB gain at 1 MHz), and A/D converted by a
Tektronix RTD-7 10 digitizer. The received samples were downloaded to the control
computer for calculation of RMS levels.
Figure 8 shows the sensitivity curves for six square polyurethane
encapsulated hydrophones on one chip. The broad sensitivity peaks trend toward
lower frequencies as the diaphragms get larger, as expected. The cause of the
sensitivity null at 1.5 MHz is unknown, but may be related to the encapsulation
thickness. Higher sensitivities (up to -225 dB//lV/pPa) have been measured on
transducers without polyurethane coating, measured in silicone oil filled bags.
Beam Patterns
For beam pattern tests, a single frequency is chosen and the sensor is rotated over
a desired range of angles around the horizontal and vertical axis. Generally, beam
patterns were run for two sets of angles, -90 deg to +90 deg in 2-deg increments,
and -10 deg to +10 deg in 0.25-deg increments.
FERROELECTRIC MONOMORPH TRANSDUCERS [ 577y303
-240
-245
(d -250
n
3.
3
v- -255
4
2
8 -260
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-265
-270
Frequency (MHz)
Acoustic -1
Figure 10 shows an acdustic lens designed at Draper Lab and fabricated by Cosmo
Optics. Key features of the fens include a 19- aperture, 28+ field of view, very
low field curvature (important for off-axis performance), low F nnfnbcr (1. I), and an
athermal design over 0 to 20OC. The lens consists of four elements -- three of
polystyrene and one of silicone oiI.13
A projector was used to ensonify the entire field of view, and the lens was
used only on the receive element. A sound diffuser was used to defocus the beam of
the projector for uniform target ensonification. This allows the entire image to be
formed with each transmit cycle, assuming a complete acoustic retina. For
3044578) J.J. BERNSTEIN ('I a/.
0
-5
-lQ
-15
=
3Q -20
-25
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-40
-45
-50
8 (Degrees)
FIGURE 9 Horizontal and vertical beam patterns for a 260 pm square
transducer. This transducer was used to produce acoustic images.
CONCLUSJONS
This paper has presented a new combination of micromachining and thin-film PZT to
form miniature monomorphs for acoustic imaging. Square sensors ranging in size
from 0.2 mm to 1.0 mm, and rectangular sensors from 0.14 mm to 0.3 mm by 2 mm
306/[580] J.J. BERNSTEIN e l al.
ACKNOWLEDGMENTS
The authors gratefully acknowledge financial support from the Naval EOD
Technology Center and Draper Laboratory IR&D for this work. The authors would
like to acknowledge the helpful contributions of Greg Cappiello for acoustic lens
design, Frank Petkunas for packaging, the entire fabrication team led by Connie
Cardoso for wafer fabrication, and Steve Finberg for electronic design.
REFERENCES
J.J. Bernstein, "A Micromachined Condenser Hydrophone,"
the Soe-1 Sensor Actuator Wo- , Hilton Head Island, (June
1992).
J.J. Bernstein, M. Weinberg, E. McLaughlin, J. Powers and F. Tito, "Advanced
Micromachined Condenser Hydrophone", 2
-ator Wor- , Hilton
. . Head Island, (June 1994),
. . pp.. .73-77.
R.G. Swartz, -cat ion of Polvviovlidene n u d e to M o m c silicon PVFZ
, s -T PhD. Dissertation, Stanford University, (May 1979).
J.H. Mo, J.B. Fowlkes, A.L. Robinson, and P.L. Carson, "Crosstalk Reduction
with a Micromachined Diaphragm Structure for Integrated Ultrasound
Transducer Arrays," F E E Trans. Ultrasonics. Ferroelectrics and Fret-
Control, U. 38, (January 1992), pp. 48-53.
J.H. Mo, A.L. Robinson, D.W. Fitting, F.L. Terry, and P.L. Carson,
"Micromachining for Improvement of Integrated Ultrasound Transducer
Sensitivity," F E E T r u . Electron Devices, M. ED-37, (Jan. 1990), pp. 130-
136.
FERROELECTRIC MONOMORPH TRANSDUCERS [581]/307