A High-PSRR NMOS LDO Regulator With Intrinsic Gain-Tracking Ripple Cancellation Technique
A High-PSRR NMOS LDO Regulator With Intrinsic Gain-Tracking Ripple Cancellation Technique
I. I NTRODUCTION
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R F B2 /R F B1 R
F B2
≃ 1, ≫1 . (3)
1 + R F B2 /R F B1 R F B1
(R F B2 /R F B1 )gm(P T )ro(P T )
1−
VOU T (1 + R F B2 /R F B1 )gm(R P T )ro(R P T )
P S R R(s) = = ro(P T ) (2)
VI N 1 + gm(P T )ro(P T ) (1 + A E A (s)Z (s)) +
ZL
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Fig. 10. (a) Cross section of a poly resistor and subcircuit models,
and (b) simplified II-section model of the poly resistor and an expected
representation of Cp(SA) .
and PSRR(s)SA .
T (s)global
P S R R(s)| E A&S A = (P S R R E A + P S R R S A ).
1 + T (s)global
(4)
Fig. 7 presents the statistics from a 1,000-run Monte Carlo
simulation, displaying results at 100 kHz, 1 MHz, and 10 MHz
under maximum IL . The mean PSRR values (µ) were 84.8 dB
at 100 kHz, 83.2 dB at 1 MHz, and 61.1 dB at 10 MHz
Fig. 11. (a) AC post-layout simulation results of the proposed LDO. (b) Phase
with corresponding standard deviations (α) of 8.4 dB, 4.7 dB, margin with IL versus process corner, supply voltage, and temperature
and 0.9 dB, respectively. It should be noted that the parasitic variation.
capacitance components are not reflected in Fig. 7, and the
Monte Carlo simulation results of the LDO were conducted terminal of the EA by CZ and ro(EA) . The third non-dominant
under the following conditions: VIN = 1.4 V, VREF = 1.2 V, pole (ω p3 ) is generated from the signal synthesis of the main
VBAT = 3.8 V, and 27 ◦ C. control loops and the IGTRC loop in the SA.
In applications requiring very high load currents (>1A), As indicated in (3), a large value for RFB2 is required
there could be performance variations due to the mismatch to enhance the PSRR performance, resulting in significant
between MPT and MRPT and current sensing inaccuracies. parasitic capacitance due to the large area of RFB2 . For SA to
Thus, further research into techniques that can enhance have sufficient gain, ro(SA) should also have a sufficient value.
matching performance will be required in future studies. Under both conditions, ω p3 moves to a lower frequency
1
ω p1 = (5)
B. Stability Analysis C L (ro(P T ) ∥ Z L )
In the proposed design, the signal paths of each loop are 1
ω p2 = (6)
superimposed at the gates of MPT and MRPT , as depicted C Z (ro(E A) + R Z )
in Fig. 8. The two loops have distinct functions, where the 1
IGTRC loop containing MRPT , B, and SA functions as a ripple ω p3 = (7)
1 + R F B2 /R F B1
cancellation loop to improve the PSRR, and the main control C p(S A)ro(S A)
gm(S A)ro(S A) + 1 + R F B2 /R F B1
loop feeds VOUT back to the EA to regulate VOUT .
1
To analyze the global loop stability (T(s)global ), open- ωz1 = (8)
loop AC analysis was performed by opening the loop at CZ RZ
1
the summing stage output, as modeled in Fig. 9 and based ωz2 = (9)
on Fig. 8 [22]. Assuming 1 ≫ (1 + RFF2 /RFF1 )/ASUM (s) CL RE S R
[16], the overall loop gain transfer function of the LDO as Cp(SA) increases, indicating the deteriorating phase margin
is defined by (10), as shown at the bottom of the next and stability of the LDO under large values of Cp(SA) .
page, which contains three poles and two zeros that can be Therefore, to mitigate stability issues while improving
expressed as (5)-(9). PSRR performance, high sheet-resistance resistors with low
The dominant pole (ω p1 ) is generated by CL , while the parasitic capacitance should be used. High sheet resistance
second non-dominant pole (ω p2 ) is generated at the output poly-resistors have lower parasitic capacitance compared to
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other resistors because they can be placed on top of a thick In the presented design, RFB1 and RFB2 were constructed
oxide [18]. using unit resistors, each with a resistance of 20.1 k. RFB1
Fig. 10(a) shows the cross-sectional layout of a typical consisted of 9 units connected in parallel, and RFB2 consisted
poly-resistor. The resistor is surrounded by oxides on all of 16 units connected in series. Therefore, the resistance ratio
sides, which provides capacitive dielectric coupling of the between RFB1 and RFB2 was approximately 160. RFB2 had
resistor to neighboring components. This parasitic capacitance a poly area of 53.44 µm2 , resulting in parasitic capacitance
is uniformly distributed along the poly-resistor, where the Cp(SA) of approximately 29.3 fF.
deposited and field oxides have capacitances of 0.5 fF/µm2 The first zero (ωz1 ) is generated at the output terminal of the
and 0.05 µm2 , respectively [19]. EA through the series connection of CZ , RZ , and a transistor.
Therefore, as shown in Fig. 10(b), Cp(SA) can be defined This transistor adjusts the series resistance to be inversely
as the sum of the parasitic capacitance of the poly resistor. proportional to IL to compensate for the second non-dominant
Consequently, the total parasitic capacitance of both oxides is pole [3]. The second zero (ωz2 ) is induced by the equivalent
0.55 fF/µm2 . series resistance (ESR) of CL .
Vol,out
= T (s)global
Vol.in
R F B1
−gm(E A)ro(E A) 1 + (1 + sC Z R Z )(1 + sC L R E S R )
R F B2
≃ (10)
1 + R F B2 /R F B1
{1 + sC L (ro(P T ) ||Z L )}{1 + sC Z (ro(E A) + R Z )} 1 + sC p(S A)ro(S A)
gm(S A)ro(S A) + 1 + R F B2 /R F B1
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Fig. 16. Measured (a) load regulation, (b) line regulation (IL = 100 mA), (c) quiescent current, (d) load transient response for a IL step of 100 mA, (e) line
transient response for a VIN step of 1 V (IL = 100 mA).
TABLE I
P ERFORMANCE S UMMARY AND C OMPARISON W ITH S TATE - OF - THE -A RT LDO S
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[1] K. Li, C. Yang, T. Guo, and Y. Zheng, “A multi-loop slew-rate- Power Electron., vol. 35, no. 1, pp. 415–429, Jan. 2020.
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[24] F. Lavalle-Aviles, J. Torres, and E. Snchez-Sinencio, “A high power Hongyup Jeong (Graduate Student Member, IEEE)
supply rejection and fast settling time capacitor-less LDO,” IEEE Trans. received the B.S. degree in electrical and com-
Power Electron., vol. 34, no. 1, pp. 474–484, Jan. 2019. puter engineering from Anyang University, Anyang,
[25] T. Guo, W. Kang, and J. Roh, “A 0.9-µA quiescent current high PSRR South Korea, in 2024. He is currently pursuing the
low dropout regulator using a capacitive feed-forward ripple cancellation M.S. degree with the Department of Electrical and
technique,” IEEE J. Solid-State Circuits, vol. 57, no. 10, pp. 3139–3149, Electronic Engineering, Hanyang University, Ansan,
Oct. 2022. South Korea. His research interests include power
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Design, 1st ed., Singapore: Wiley, 2016. circuits.
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