Unit 5: NANOTECHNOLOGY

Q5.1. What are nano materials and what is nanotechnology?

We know all materials are composed of atoms with different sizes. Any
material having very closely packed atoms within the size range of 1 to 100
nanometres are called nanomaterials.
The technology emerged from this is called Nanotechnology. Using these
highly latest technology nano materials can be formed from metals, ceramics
polymers and even from liquids.
Q5.2. What are two approaches in nanotechnology?
(M.U. Dec. 2015, 16, 17; May 2015, 19) 15 marks]
There are two methods for the production of nanomaterials: as shown in
Figure 5.2.1.

Nano Clusters Atom

Bulk Fragments
scale

Top Down Bottom Down

Approach Approach
igure 5.2.1: Techniques of Nano synthesis

(0 Bottom-up approach:
In these nanomaterials are made by building atom by atom or molecule by
molecule.
These approaches include:
1)chemical synthesis
2)self-assembly
3)positional assembly

(11) Top-down approach:

In this a bulk material is broken or reduced in size or pattern. The techniques
developed under this are modified or improved one what we have in use to
fabricate micro-processors, micro-electro-mechanical system.
Q5.3. Write a short note on Scanning Electron Microscope (SEM)?

(M.U. May 2013, 14, 17; Nov 2018; Dec 2013, 14, 16, 19) [5marks]
SEM is used to obtain Filament
images of surface of
thickness. Also, a thin
specimen can be Condenser
Lens
studied. Construction
of TEM includes an
arrangement that
makes it possible for
Scanning
an electron beam to Coils

scan the specimen

Objective
similar to that we have Lens
in TV picture tubes.
Here as shown in
e Specimenn

Figure 5.3.1 electron Detector

beam is obtained from Figure 5.3.1: Scanning Electron Microscope
electron gun and it is
made to pass through a condenser lens. Next stage is the scanning
coil which is used to focus the electron beam on a small spot-on
specimen surface and also to scan the surface like electron beam
scans in TV picture tubes.

Image formation in SEM is due to two main combining aspects

a. Scattering of electron beams is because of atoms on the surface
of the specimen and these atoms have different scattering power.
b. Topographical variations of the surface.
Actually, the aspects mentioned above are also responsible for
the contrast which is essential for image formation.
During the scanning of atoms by electron beam, the scattered
electrons intensities are measured by detector and then displayed
on the screen. If the scattering is high at a particular point during the
scanning, the corresponding point on the viewing screen will be
bright and for low scattering, the corresponding point on the screen
will be dark. This develops required contrast for a clear image of the
specimen.
Specimen as small as 50A° size may be clearly resolved by SEM.
Q5.4. Write a short note on Atomic Force Microscope?
(M.U. Dec. 2012, 16, 17; May 2015, 16, 19) [5 marks]

Atomic Force Microscope or the AFM is a scanning microscope used as an

imaging device. It works on the basic principle of recording the scattering
of electromagnetic radiation i.e. when the laser beams are scattered off of
the surface of the sample material, the readings are recorded by the
microscope. These readings are detailed to the atomic level and the three
dimensional images produced have atomic resolution.
The AFM consists ofa sharp tip probe which is attached to a cantilever
on the top. The tip of the probe is about 1 nm in radius and the length of
the cantilever is about 10 nm. The surface ofthe cantilever is highly
reflective.
A laser beam is passed through an optical fibre to be made incident on
the surface of the cantilever. As the probe moves around the surface of
the sample it experiences different kinds of forces.
This in turn makes the cantilever undergo deflection. These deflections
are recorded with the help of photo detectors.
Depending upon the material the forces could be electrostatic,
mechanical, magnetic or even Van Der Waals forces.
The readings from the photo detectors are then processed and used to
create three dimensional images of the topography of the sample.
The resolution of the image is in nanometers.

- - Photodetector
Laser

Cantilever - - -

- - - - Probe

Sample

Figure 5.4.1: Atomic Force Microscope

Q5.5. Explain the Ball Milling method of nanoparticle synthesis?
(M.U. May 2013, 14, 17, 18; Nov. 2018; Dec. 2013, 14, 16, 19) [5 marks]
Ball Milling method is a physical/mechanical process of creating
nanoparticles.
In this method small hard steel balls are used to make nanoparticles
These balls are kept in a container along with the powdered form of the
material.
These containers are made to rotate about their own axis while
revolving around in a circular motion.
This creates centrifugal and centripetal forces which cause the steel
balls to collide with the powdered material continuously and create
nanoparticles.
The size of the steel balls are inversely proportional to the size of the
nanoparticles they create.
This method is generally used to create nanoparticles of metals and
alloys.

Inlet Outlet

Milling
Powder
Vessel

Milling
Balls

Figure 5.5.1: Ball Milling

Q5.6. Explain the Sputtering method of nanoparticle synthesis?

(M.U. May 2019) [5 mark]

Sputtering is a process in which the target material is subjected to high
energy particles. This causes the material to vaporise and the nanoparticles
of this material is collected in the collecting rod.
A typical arrangement of thin film deposition using sputtering is shown in
the given figure. A sufficiently large potential difference is maintained
between the substrate and the target. Argon gas is introduced into the
enclosure at low pressure which can be varied.
The argon atoms get ionized due to the large potential difference. The
positive argon ions hit the target with a large velocity and dislodge its atoms.
The atoms move towards the substrate and get deposited on it.

The thickness of the film can be controlled by varying the argon gas pressure
and the time for which the sputtering process is carried out. Thickness as
small as a fraction of a nanometre, i.e., atomic monolayers, have been
successfully deposited using this method.

Substrate And Film Growth

Sputtering Gas

Sputtering Target

Figure 5.6.1: Sputtering9

Q5.7. Explain the Vapour Deposition method of nanoparticle
synthesis?
(M.U. May 2013, 14, 17, 18; Nov. 2018; Dec. 2013, 14, 16, 19) I5 marks]
The bulk material kept in a crucible is evaporated and the particles formed
are blown away by using an inert gas towards the liquid nitrogen cooled
cylinder called cold finger.
This assembly is placed in an evacuated chamber.
The evaporated particles get condensed and are collected on the cold finger,
which are scraped off and fall into collection tray from the funnel.

The size of particles is controlled by changing the distance between the

crucibles and the cold finger and by changing the inert gas pressure
Cold Finger
Scraper

Clusters

Inlet

EvaporationGas

Vacuum Pump
..-- Collection Tray

Figure 5.7.1: Vapour Deposition

Q5.8. Explain the SOL Gel Technique method of nanoparticle
synthesis?
(M.U. May 2013, 14, 17, 18; Nov. 2018; Dec. 2013, 14, 16, 19) [5 marks]
Sol-gel method is a chemical process used to synthesize nanoparticles. It
is one of the best and eficient methods to synthesize nanoparticles.
In this method a solution is used with particles suspended in it.
A powdered form of the material to be synthesized is mixed with
chemicals to form the solution or sol. As time passes, long chained
polymers are formed in this solution.
These long chained polymers result in the formation of gel. Only a part
of the sol gets converted to gel.
The sol-gel method with the cavitation effect produces nanoparticles.
The sol-gel method is a bottom up approach and it can be used to
produce nanoparticles of almost any material.

(Dehyradation
Reaction)

Rapid
(Dissolve) 8
DryinB Aerogel
Percursor Gel

Surfacant Organic
Dipping
Suspension Xerogel

Thin Film Coating Dense Ceramic

Powder

Figure 5.8.1: SOL Gel Technique