File 1
File 1
2005"
High-frequency sinusoidal oscillations of a coarse-grained polymer model are used to calculate the
local dynamic mechanical properties !DMPs" of free-standing polymer thin films. The storage
modulus G! and loss modulus G" are examined as a function of position normal to the free surfaces.
It is found that mechanically soft layers arise near the free surfaces of glassy thin films, and that their
thickness becomes comparable to the entire film thickness as the temperature approaches the glass
transition Tg. As a result, the overall stiffness of glassy thin films decreases with film thickness. It
is also shown that two regions coexist in thin films just at the bulk Tg; a melt-like region !G!
! G"" near the free surfaces and a glass-like region !G! " G"" in the middle of the film. Our findings
on the existence of a heterogeneous distribution of DMPs in free-standing polymer thin films
provide insights into recent experimental measurements of the mechanical properties of glassy
polymer thin films. © 2005 American Institute of Physics. #DOI: 10.1063/1.1873732$
I. INTRODUCTION results suggest that a mobile layer exists near the free sur-
face, and that a substrate can have a strong influence in the
The thermal and mechanical properties of polymeric dynamics of polymer thin films.
nanostructures are of critical importance in a wide variety of It is intuitively attractive to anticipate a correlation be-
technological applications. In advanced lithography, the stiff- tween a localized, enhanced polymer motion and a local me-
ness of photoresist patterns is an important parameter in the chanical weakening of a material. To the best of our knowl-
capillary force induced collapse that arises as rinsing sol- edge, however, the local mechanical properties of polymer
vents evaporate.1,2 The glass transition temperature Tg of thin films have not been measured as a function of position
chemically amplified photoresist thin films is also a key pa- within the film. It is also important to note that the mechani-
rameter for optimization of lithographic processes.3 cal deformation of polymeric nanostructures observed in ad-
A number of experimental4–7 and theoretical8,9 studies vanced lithography1,2 takes place at room temperature, i.e.,
have shown that Tg of thin polymer films can change with 20%–30% below the Tg of amorphous polymers such as PS
thickness h. Mattsson, Forrest, and Börjesson, for example, and poly!methyl methacrylate" !PMMA". The mechanical
report that the Tg of free-standing polystyrene !PS" thin films properties of amorphous polymers are nearly independent of
decreases monotonically below thicknesses of 100 nm.4 In temperature in the glass region, but they change significantly
contrast, past work by our group suggests that the Tg of as Tg is approached.10,11 The extent of softening in glassy
supported PS thin films can be either larger or lower than the thin films will therefore depend not only on thickness but
bulk Tg for h ! 100 nm, depending on the chemical interac- also on the proximity to Tg.
tions between the substrate and the polymer matrix.5,7 Recent experimental studies suggest that the overall
Torres, Nealey, and de Pablo have demonstrated in mo- stiffness of glassy polymer thin films remains comparable to
lecular dynamic simulations that the diffusivity of polymer that of the bulk for film thicknesses in the range 30–40
segments is highly heterogeneous in polymer thin films and nm.12,13 The Young’s modulus E of PS thin films, for ex-
that it is strongly correlated with deviations of Tg from the ample, is comparable to that of the bulk for h " 30 nm.12
bulk.8 Ellison and Torkelson have recently quantified dy- Also, the propagation of acoustic waves through PMMA thin
namic heterogeneities in supported PS thin films by using a films exhibits the same velocity as in the bulk for h
fluorescence-multilayer technique, which is capable of mea- " 40 nm.13 Similar observations emerge from molecular
suring local Tg at different locations in the film.6 For rela- simulations of polymer nanostructures.14,15 The overall bend-
tively thick films !h = 270 nm", the Tg near the free surface is ing modulus of the glassy nanostructures remains bulk-like
shown to be %30 K lower than the bulk Tg !=374 K", until a critical dimension !e.g., line width" approaches 20#.
whereas no change of Tg is found in the the middle or near The symbol # represents the diameter of the coarse-grained
the bottom of the film. For thinner films !h = 24, 36 nm", polymer segments in simulations. A length of 20# would
however, a decrease of the local Tg is observed across the translate into 30–40 nm for amorphous PS or PMMA films.16
films, but its magnitude becomes smaller, i.e., 4–14 K. These Experiments and simulations therefore suggest that the
onset of changes of mechanical properties does not occur
a"
Electronic mail: [email protected] until thicknesses on the order of 30–40 nm are attained. It
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144712-2 Yoshimoto et al. J. Chem. Phys. 122, 144712 "2005!
' (
&
dv!r" lation runs. By plotting the energy !or the density" as a func-
v!r" − v!rc" − !r − rc" r $ rc tion of temperature, T*g was estimated to be 0.37 for the thin-
u!r" = dr r=rc , !1" ner films of 22 chains and 0.40 for the bulk and the thicker
0 r " rc films of 44 chains.9
where r is the distance between the two monomers and rc is
the cutoff distance !=2.5#". The function v!r" is a simple
Lennard-Jones potential energy function,
v!r" = 4%#!#/r"12 − !#/r"6$, !2" B. Method
where # and % represent the monomer diameter and the in- To calculate the loss and storage modulus of our sys-
teraction energy parameter, respectively. For bonded pairs, tems, we implemented a SLLOD algorithm with Lee–
u!r" is represented by a simple harmonic potential, Edwards periodic boundary conditions.17–20 NEMD simula-
tions were performed under an oscillatory shear flow.17,18
u!r" = k!r − r0"2/2, !3"
The temperature was kept constant via a Nose–Hoover chain
where k and r0 are the spring constant !=2000% / #2" and the thermostat.19,20 A double thermostat of unit mass was em-
bond length !=1#", respectively. Note that r0 is slightly ployed. The time-dependent shear strain imparted to our sys-
smaller than the distance at the energy minimum of the tems, (xy!t", is given by a simple sinusoid of the form
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144712-3 Local dynamic mechanical properties in model free-standing polymer thin films J. Chem. Phys. 122, 144712 "2005!
' !t" =
xy −1
V
') N
mivxi !t"viy!t"
(
i=1
)* * dU!r" rxij!t"rijy!t"
− , !5"
i"j dr r=rij!t" rij!t"
+
respectively.
+
N
−1
'xy!t,z" =
A
) mivxi !t"viy!t"*#z − rzi !t"$ 'xy!t"/(max = G!!)"sin )t + G"!)"cos )t
. !8"
i=1 'xy!t,z"/(max = G!!),z"sin )t + G"!),z"cos )t
)* * dU!r" rxij!t"rijy!t" In the fitting, the sum of the squared differences between the
−
r=rij!t" rij!t" calculated stress and that predicted from Eq. !8" was mini-
(-
i"j dr
' ('
mized by optimizing the two independent parameters, G!!)"
1 z − rzi !t" rzj !t" − z and G"!)" for the bulk, or G!!) , z" and G"!) , z" for thin
+ , , , !6"
,rzij!t", rzij!t" rzij!t" films. Note that G! and G" must be independent of the strain
amplitude (max at a given frequency as shown in Eq. !8". We
where , is the Heaviside step function. Note that 'xy !t , z", verified this independence by performing the same calcula-
represents the average local stress over the area of the xy tions described above with several different amplitudes. In
plane, denoted by A. The kinetic term in Eq. !6" and the local what follows, we show the DMPs averaged over different
density, initial configurations and/or different strain amplitudes.
N
1
&!t,z" = )
A i=1
mi*#z − rzi !t"$, !7" III. RESULTS AND DISCUSSION
A. DMPs for the bulk
were estimated with a technique developed by Daivis, In Fig. 2, the DMPs for the bulk are shown as a function
Travis, and Todd.22 The two velocity components, vxi and viy of temperature. The frequencies )* employed in this study
are independent, so the kinetic terms in Eqs. !5" and !6" are 0.30, 0.06, and 0.03. We should note that, in order to
become approximately zero. obtain the DMPs at )* = 0.03, we have run the NEMD simu-
Over 50 oscillation cycles were applied to all systems. In lations over 108 time steps; this required one month of com-
each cycle, instantaneous stresses were determined from Eq. puter time on a 2 GHz CPU.
!5" and !6" at regular time intervals. The dominant frequency At )* = 0.3 #Fig. 2!a"$, it is observed that the decrease of
of the stress data was analyzed by a discrete Fourier trans- the stiffness G!* as the glass transition is traversed is only a
form. As expected, all results were consistent with the fre- factor of 10. The loss modulus G"* does not exhibit a clear
quency of the applied strain, namely, ) in Eq. !4". The stress peak in the vicinity of the glass transition. In addition, the
data were subsequently fitted to an expression of the form:10 intersection point of G!* and G"*, which can be viewed as
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144712-4 Yoshimoto et al. J. Chem. Phys. 122, 144712 "2005!
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144712-5 Local dynamic mechanical properties in model free-standing polymer thin films J. Chem. Phys. 122, 144712 "2005!
TABLE I. Ratio of the soft surface layers hs* to the entire film thickness h*.
T* = 0.5, 0.6", G"*!z*" becomes larger than G!*!z*" for most The results are shown in Fig. 6. In the glass region, the G!*
values of z*; the entire film turns into a highly viscoelastic curve for the 22# film !# with solid line" almost overlaps
melt. with that for the bulk !! with solid line"; however, that for
It is also interesting to observe in Fig. 4 that the hetero- the 11# film !" with solid line" exhibits a systematic depar-
geneous behavior of G!*!z*" and G"*!z*" does not simply ture from the other two. As discussed in the preceding sec-
correspond to the local density profile, particularly near the tion, a decrease of G! in thinner films is due to the greater
free surfaces. Far below the bulk T*g, there exists a small lag contribution !greater surface to volume ratio" of soft surface
between G!*!z*" and &*!z*"; &*!z*" reaches the bulk density
first, and then G!*!z*" rises to the bulk G!*. This delay of
G!*!z*" is mainly due to the lower density near the free sur-
faces. Note that the transition of &*!z*" from zero to a bulk
density is completed within 1–2# at all temperatures, and the
shoulder slope of &*!z*" is only weakly dependent on tem-
perature. Meanwhile, the shoulder slope of G!*!z*" becomes
milder at higher temperatures !i.e., T* = 0.3, 0.4", and several
of the surface underlying layers exhibit a G!*!z*" below the
bulk value, even if a bulk density has been attained !see, for
example, z* = 4.0–6.0 and z* = 25.5–24.0 at T* = 0.3, z*
= 3.5–6.5, and z* = 25.0–22.0 at T* = 0.4". This decrease of the
stiffness at bulk-like densities is consistent with observations
that the motion of polymer segments near interfaces is highly
cooperative,9 and that the activation energy for segmental
motions near free surfaces is much lower.24 Faster segmental
motions near the free surfaces can initiate a global rotational
motion that includes many segments,9 and the mobility of
polymer segments in the film can be enhanced even under
bulk-like conditions.24 Above the bulk T*g, we could not find
a clear relationship between &*!z*" and G!*!z*" or between FIG. 6. Overall DMPs of thin films at )* = 0.03 vs temperature; ! for the
bulk, # for 22# thick film, " for 11# thick film. G!* and G"* are shown
&*!z*" and G"*!z*", mainly as a result of relatively large fluc-
with solid and dashed lines, respectively. An arrow indicates the intersecting
tuations. point of the two curves of G!* and G"*. The inlet shows the ratio of G!* for
The behavior of 11# films !see Fig. 5" is similar to that the thin films to the bulk G!* as a function of temperature.
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144712-6 Yoshimoto et al. J. Chem. Phys. 122, 144712 "2005!
1
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of the decrease in G! is further clarified in the inset of Fig. 6. 3
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4
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IV. CONCLUSIONS 8
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!2000".
In our calculations of the local DMPs for free-standing 9
T. S. Jain and J. J. de Pablo, J. Chem. Phys. 120, 9371 !2004".
polymer thin films with oscillatory deformations, it is shown 10
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11
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room temperature for PS and PMMA, we found that the ratio K. Van Workum and J. J. de Pablo, Nano Lett. 3, 1405 !2003".
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M. Rubinstein and R. H. Colby, Polymer Physics !Oxford University
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ACKNOWLEDGMENTS 22
P. J. Daivis, K. P. Travis, and B. D. Todd, J. Chem. Phys. 104, 9651
!1996".
This work was supported by the Semiconductor Re- 23
N. Satomi, K. Tanaka, A. Takahara, and T. Kajiyama, Macromolecules 34,
search Corporation !SRC" and the National Science Founda- 6420 !2001".
tion !NSF" NIRT program. 24
T. S. Jain and J. J. de Pablo, Phys. Rev. Lett. 92, 155505 !2004".
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