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Pierre Ruterana, Martin Albrecht, Jörg Neugebauer
Nitride Semiconductors
Handbook on Materials and Devices
Pierre Ruterana, Martin Albrecht, Jörg Neugebauer
Nitride Semiconductors
Handbook on Materials and Devices
Pierre Ruterana, Martin Albrecht, Jörg Neugebauer
Nitride Semiconductors
Handbook on Materials and Devices
Editors n This book was carefully produced. Nevertheless,
authors and publisher do not warrant the infor-
Pierre Ruterana mation contained therein to be free of errors.
Laboratoire d’Etude et de Recherches Readers are advised to keep in mind that state-
sur les Matériaux ments, data, illustrations, procedural details or
France other items may inadvertently be inaccurate.
e-mail:
[email protected]Martin Albrecht
University of Erlangen
Germany
Library of Congress Card No.: applied for
e-mail: [email protected]
British Library Cataloguing-in-Publication Data
Jörg Neugebauer A catalogue record for this book is available from
Fritz-Haber-Institute of Max-Planck-Society the British Library.
Germany
Bibliographic information published
e-mail: [email protected]
by Die Deutsche Bibliothek
Die Deutsche Bibliothek lists this publication
in the Deutsche Nationalbibliografie; detailed
bibliographic data is available in the Internet at
1st edition
<http://dnb.ddb.de>
© 2003 WILEY-VCH Verlag GmbH & Co. KGaA,
Weinheim
All rights reserved (including those of translation
in other languages). No part of this book may be
reproduced in any form – by photoprinting, mi-
crofilm, or any other means – nor transmitted or
translated into machine language without written
permission from the publishers. Registered
names, trademarks, etc. used in this book, even
when not specifically marked as such, are not to
be considered unprotected by law.
Printed in the Federal Republic of Germany
Printed on acid-free paper
Composition K+V Fotosatz GmbH, Beerfelden
Cover Picture
Printing betz-druck gmbh, Darmstadt
P. Gibart et al:
Bookbinding Litges & Dopf Buchbinderei GmbH,
Scanning electron microscope image showing
Heppenheim
the epitaxial lateral overgrowth of GaN from
hexagonal openings ISBN 3-527-40387-6
V
Contents
Preface XVII
List of Contributors XIX
Part 1 Material 1
1 High-Pressure Crystallization of GaN 3
Izabella Grzegory, Stanisław Krukowski, Michaeł Leszczyński, Piotr Perlin,
Tadeusz Suski, and Sylwester Porowski
1.1 Introduction 4
1.2 High-Pressure Crystallization of GaN 5
1.2.1 Thermodynamics – Properties of GaN-Ga-N2 System 5
1.2.2 Dissolution Kinetics of N2 and Crystal Growth Mechanism 8
1.2.3 What Happens with GaN at High Temperature
when the N2 Pressure is too Low? 12
1.2.4 Crystallization of GaN Using High Nitrogen Pressure
Solution Growth (HNPSG) Method – Experimental 13
1.2.5 Properties of GaN Single Crystals Obtained
by HNPSG Method 14
1.2.5.1 Crystals Grown without Intentional Seeding 14
1.2.5.2 Seeded Growth of GaN by HNPS Method 18
1.2.6 Physical Properties of GaN Crystals, Grown by HNPS Method 21
1.2.6.1 Point Defects 21
1.2.6.2 Extended Defects 24
1.3 Epitaxy on Bulk GaN 26
1.3.1 Introduction 26
1.3.2 Metalorganic Chemical Vapor Epitaxy on GaN Substrates
in HPRC Unipress 26
1.3.3 Molecular Beam Epitaxy 32
1.4 Optoelectronic Devices 35
1.4.1 Introduction 35
1.4.2 Light Emitting Diodes Fabricated on Bulk GaN in HPRC 35
1.4.3 Laser Diode Structures 36
VI Contents
1.5 Conclusions 40
1.6 Acknowledgment 41
1.7 References 41
2 Epitaxial Lateral Overgrowth of GaN 45
Pierre Gibart, Bernard Beaumont, and Philippe Vennéguès
2.1 Heteroepitaxial GaN 46
2.1.1 Introduction 46
2.1.2 Growth of GaN/Sapphire and 6H-SiC Templates 48
2.1.2.1 2D Growth Mode (GaN/Sapphire) 48
2.1.2.2 3D Growth Mode (GaN/Sapphire) 49
2.1.3 Defects in GaN/Sapphire and GaN/6H-SiC 51
2.1.3.1 Extended Defects 51
2.1.3.2 Native Defects 52
2.1.3.3 Defect-Related Optical Properties 52
2.1.3.4 Device Performance Limitations 54
2.1.3.5 Electronic Properties of Defects 54
2.2 Epitaxial Lateral Overgrowth (ELO) 56
2.2.1 Standard ELO 56
2.2.2 Rationale 56
2.2.3 Experimental 58
2.3 One-Step Lateral Overgrowth (1S-ELO) 59
2.3.1 ELO in MOVPE 59
2.3.1.1 Morphology and Defects 59
2.3.1.2 Structural Assessment 63
2.3.1.3 Kinetics 64
2.3.1.4 In-Depth Optical Assessment of MOVPE ELO GaN 65
2.3.2 HVPE 66
2.3.2.1 In-Depth Assessment of HVPE ELO GaN 67
2.3.2.2 Stripe Openings along h1120i 68
2.3.2.3 Selective Area Epitaxy (SAE) 72
2.3.2.4 (C2H5)2GaCl as Ga Source 72
2.3.2.5 Stress Generation 73
2.3.3 Sublimation 74
2.3.4 New Developments 75
2.3.4.1 ELO on Si 75
2.3.4.2 Using W as Mask 75
2.3.4.3 Maskless ELO 75
2.3.5 Improvements of the Standard ELO Method 76
2.3.6 Pendeo-Epitaxy 77
2.3.7 ELO of Cubic GaN 80
2.4 Two-Step ELO (2S-ELO) 80
2.4.1 Experimental (MOVPE) 80
2.4.2 In-Depth Assessment of 2S-ELO 84
2.4.2.1 Cathodoluminescence 84
Contents VII
2.4.2.2 Luminescence of GaN by Epitaxial Lateral Overgrowth 88
2.4.2.3 Time-resolved Photoluminescence 89
2.4.2.4 Deep Level Transient Spectroscopy (DLTS) 89
2.4.2.5 Strain Distribution 90
2.4.3 Assessment of HVPE 91
2.4.4 ELO and Yellow Luminescence 93
2.4.5 Conclusion 95
2.5 New Trends 95
2.5.1 3S-ELO 95
2.5.2 Further Improvements 96
2.6 Theoretical Analysis of ELO 97
2.7 Acknowledgments 98
2.8 References 99
3 Plasma-Assisted Molecular Beam Epitaxy of III–V Nitrides 107
Alexandros Georgakilas, Hock Min NG, and Philomela Komninou
3.1 Introduction 108
3.2 The Nitrogen Plasma Source 109
3.2.1 The Different Sources 109
3.2.2 The Nitrogen Plasma 111
3.2.3 Characterization of the HD25 RF Source
by Optical Emission Spectroscopy 115
3.2.4 Which is the Best Source? 118
3.3 Fundamentals of the GaN (0001) Epitaxial Growth by PAMBE 120
3.3.1 Structure of the GaN {0001} Surfaces 120
3.3.2 GaN Substrate Preparation 127
3.3.3 Physical Understanding of the Growth on GaN (0001) Surfaces 131
3.3.3.1 Growth Chemistry 131
3.3.3.2 GaN Evaporation 132
3.3.3.3 Ga Adsorption and Desorption 132
3.3.3.4 Growth Rates as a Function of III and V Fluxes 134
3.3.3.5 The GaN Growth Regimen – a Phase Diagram 135
3.3.4 Characteristics and Optimization of the (0001) GaN Growth 140
3.3.4.1 Description of RFMBE Experiments 141
3.3.4.2 Characterization of Materials Properties 142
3.3.4.3 Optimized Growth with Interruptions 145
3.3.4.4 Conclusions 145
3.3.5 Doping of GaN 145
3.4 Heteroepitaxial Growth 148
3.4.1 Substrates for PAMBE GaN Heteroepitaxy 148
3.4.2 Important Issues in the Heteroepitaxy of GaN-on-Al2O3 (0001) 149
3.4.3 Electron Microscopy Investigation of Nitridated
Al2O3 Interfaces 150
3.4.3.1 Experimental 150
3.4.3.2 Observation and Analysis of Interfacial Defect Content 151
VIII Contents
3.4.4 Effect of Al2O3 Nitridation on the Polarity and Microstructure
of GaN Epilayers 156
3.4.5 Conclusions 161
3.5 III-Nitride Alloys and Device Heterostructures 163
3.5.1 Growth Model for Ternary III-Nitrides 163
3.5.2 InGaN 165
3.5.2.1 Phase Separation and Ordering of InGaN 166
3.5.2.2 Effect of Atomic Hydrogen on the Incorporation of In 167
3.5.2.3 InGaN LEDs 169
3.5.3 AlGaN 169
3.5.3.1 UV LEDs 171
3.5.3.2 UV Detectors 171
3.5.4 GaN/AlGaN MQWs for Intersubband Transitions 173
3.5.4.1 Electron Scattering Time between Subbands 178
3.5.5 AlGaN/GaN Heterostructures for Electronic Devices 179
3.5.5.1 AlGaN/GaN HFETs 180
3.5.5.2 AlGaN/GaN HBTs 181
3.5.5.3 AlGaN/GaN RTDs 181
3.6 Conclusions and Perspectives 181
3.7 Acknowledgments 182
3.8 References 182
4 Growth of Gallium Nitride by Hydride Vapor Phase Epitaxy 193
Agnès Trassoudaine, Robert Cadoret, and Eric Aujol
4.1 General Points on HVPE 194
4.1.1 Introduction 194
4.1.2 Principle of HVPE 195
4.1.3 Use of HVPE 196
4.1.4 Problems Associated with GaN Growth 197
4.2 Thermodynamical Study 198
4.2.1 Thermodynamical Characteristics 199
4.2.2 Partition Functions of the Molecules 202
4.2.3 Calculation of the Partial Pressures 205
4.2.4 Thermodynamical Study of the GaN Deposit 206
4.3 Kinetic Study 207
4.3.1 Introduction 207
4.3.2 Relations Between the {001} GaAs and (00.1) GaN Epitaxy 208
4.3.3 Statistical Treatment of the Dynamic Equilibrium
Surface-Vapor Phase 209
4.3.4 Mass-Transfer Phase 215
4.3.5 Crystal Growth Phase 216
4.3.5.1 H2 Growth Mechanism 217
4.3.5.2 GaCl3 Growth Mechanism 219
4.3.5.3 Spiral Growth of an Exact (00.1) Face,
Burton-Cabrera-Frank Mechanism 220
Contents IX
4.3.6 Search for the Model Parameters 220
4.3.7 Search for the Mass Transfer and Parasitic Nucleation Effects 224
4.3.8 New Mechanism of Growth at Negative Values of c 227
4.3.8.1 Experimental Results 227
4.3.8.2 Third Growth Mechanism 230
4.3.9 Discussion 231
4.4 Results 233
4.5 Conclusions 236
4.6 References 236
5 Growth and Properties of InN 241
Valery Davydov, Albert Klochikhin, Sergey Ivanov, Jochen Aderhold,
and Akio Yamamoto
5.1 Introduction 242
5.2 Growth of InN by Plasma-Assisted Molecular Beam Epitaxy 244
5.2.1 Introduction 244
5.2.2 InN PAMBE Growth Peculiarities 245
5.2.2.1 Role of Different Nitrogen Species in PAMBE 245
5.2.2.2 Maintenance of Stoichiometric Conditions During InN Growth
by PAMBE 246
5.2.3 Undoped InN Growth by PAMBE with Different Initial Stages 248
5.2.3.1 Growth and Epilayer Morphology 248
5.2.3.2 Interface with Sapphire, XRD Characterization
and Hall Measurements 251
5.2.4 Summary 256
5.3 Growth of InN by Metalorganic Molecular Beam Epitaxy 257
5.3.1 Introduction 257
5.3.2 MOMBE as a Growth Technique for InN 257
5.3.3 Growth Process 258
5.3.3.1 Growth System 258
5.3.3.2 Substrate Preparation 258
5.3.3.3 Nitridation 258
5.3.3.4 Nucleation Layer Growth 259
5.3.4 Influence of Growth Parameters on Surface Morphology 259
5.3.4.1 Influence of Growth Temperature 259
5.3.4.2 Influence of V/III Ratio 260
5.3.5 Dependence of Structural and Electrical Properties
of InN Grown by MOMBE on V/III Ratio 263
5.3.5.1 Raman Measurements 263
5.3.5.2 XRD Measurements 264
5.3.5.3 Hall Measurements 264
5.3.6 Summary 265
5.4 Metalorganic Vapor Phase Epitaxy of InN 265
5.4.1 Introduction 265
5.4.2 Experimental 266
X Contents
5.4.3 Surface Morphology and Growth Rate of MOVPE InN 267
5.4.4 Electrical Properties of MOVPE InN 270
5.4.5 Summary 274
5.5 Physical Properties of Hexagonal InN 274
5.5.1 Introduction 274
5.5.2 Lattice Dynamics of Single-Crystalline InN Layers 275
5.5.2.1 First-Order Raman Scattering 275
5.5.2.2 Phonon Dispersion in InN 278
5.5.3 Electronic Structure of Single-Crystalline InN Layers 280
5.5.3.1 Characterization of Samples 280
5.5.3.2 Absorption and Luminescence in InN 281
5.5.3.3 Luminescence and Absorption of Crystals
with High Electron Concentrations 282
5.5.3.4 Temperature Dependence of the Luminescence Band Shape 284
5.5.3.5 Concentration Dependence of PL Band
and Absorption Coefficient 284
5.5.3.6 Photoluminescence Excitation and Photomodulated
Reflectance Spectra 285
5.5.3.7 Optical Spectra of InxGa1–xN Layers 286
5.5.3.8 Wide-Gap InN-based Samples 287
5.5.3.9 Postgrowth Treatment of InN Samples 288
5.5.3.10 Proton Irradiation 289
5.5.4 Summary 289
5.6 Conclusions 290
5.7 Acknowledgments 290
5.8 References 291
6 Surface Structure and Adatom Kinetics of Group-III Nitrides 295
Jörg Neugebauer
6.1 Introduction 295
6.2 Method 296
6.2.1 Thermodynamic Equilibrium 296
6.2.2 Kinetics 299
6.3 Bare GaN Surfaces 299
6.3.1 Nonpolar Surfaces 299
6.3.1.1 Wurtzite GaN (1100) 300
6.3.1.2 Wurtzite GaN (1200) 301
6.3.1.3 Cubic GaN (110) 301
6.3.1.4 General Trends 302
6.3.2 Polar Cubic GaN Surfaces 303
6.3.2.1 GaN (001) Surface 303
6.3.3 Polar Wurtzite Surfaces 306
6.3.3.1 GaN (0001) Surface 307
6.3.3.2 GaN (0001) Surface 308
6.3.3.3 GaN (1101) Surface 310
Contents XI
6.3.4 General Trends and Comparison with Traditional
Semiconductors 311
6.3.4.1 General Trends 311
6.3.4.2 Comparison with Traditional Semiconductors 312
6.3.4.3 Conclusions 313
6.4 Adatom Kinetics 313
6.4.1 Diffusion of Adatoms on Equilibrium GaN Surfaces 314
6.4.2 Diffusion on Nonequilibrium Surfaces 315
6.5 Consequences for Growth 315
6.6 Acknowledgments 316
6.7 References 317
Part 2 Defects and Interfaces 319
7 Topological Analysis of Defects in Nitride Semiconductors 321
Georgios P. Dimitrakopulos, Philomela Komninou, Theodoros Karakostas,
and Robert C. Pond
7.1 Introduction 321
7.2 Defect Characterization 324
7.2.1 Defect Characterization by a Volterra-like Approach 324
7.2.2 Defect Characterization by Circuit Mapping 326
7.2.2.1 Circuits in Perfect Crystals 328
7.2.2.2 Circuits in Imperfect Crystals and Circuit Mapping 331
7.2.2.3 Circuit Mapping of Interfacial Defects 331
7.3 Crystalline Structures and Experimental Details 333
7.4 Dislocations in GaN Epilayers 337
7.4.1 Threading Dislocations 337
7.4.2 Stacking-fault Dislocations 341
7.4.3 Interfacial Dislocations and Dislocation Models
of Interfacial Structure 345
7.5 Inversion and Stacking Disorder in Relation
to Epitaxial Structure 349
7.6 Interface and Fault Junction Lines 356
7.6.1 Interactions of Inversion Domain Boundaries
with Stacking Faults 356
7.6.2 Double-positioning Twinning 361
7.6.3 Junction Lines between Hexagonal and Cubic Nitride Phases 367
7.7 Conclusions 369
7.8 Acknowledgments 370
7.9 Appendix: The Frank Coordinate System
for Hexagonal and Trigonal Crystallography 370
A.1 Projection from a Higher Dimension 371
A.2 Crystallographic Calculations 372
A.3 Reciprocal Space 373
A.4 Matrix Algebra 374
7.10 References 375
XII Contents
8 Extended Defects in Wurtzite GaN Layers:
Atomic Structure, Formation, and Interaction Mechanisms 379
Pierre Ruterana, Ana M. Sánchez, and Gérard Nouet
8.1 Introduction 380
8.2 Crystallographic Considerations 382
8.2.1 Substrates 382
8.2.1.1 Sapphire 382
8.2.1.2 Silicon Carbide 383
8.2.2 Epitaxial Layers 385
8.2.3 Epitaxial Relationships 385
8.2.4 Bicrystallographic Analysis of Interfacial Defects 386
8.2.5 Growth on SiC 389
8.2.5.1 Stacking Faults in 2H Polytype 390
8.2.5.2 Defects at Interface Steps 390
8.2.6 Growth on Sapphire 393
8.2.6.1 Geometrical Modeling of the First Monolayers Growth 393
8.2.6.2 Planar Defects 398
8.2.6.3 Stepless Surface 399
8.2.6.4 Steps 399
8.3 Dislocations 401
8.3.1 Misfit Dislocations 401
8.3.2 Threading Dislocations 401
8.3.3 Nanopipes 403
8.3.4 Grain Boundaries 403
8.3.4.1 The R = 19 Boundary 404
8.3.4.2 The R = 7 Boundary 406
A. The R = 7 Symmetric Boundary 406
B. The R = 7 Asymmetric Boundary 409
8.3.4.3 The R = 31 Symmetric Boundary 409
8.3.5 Formation 411
8.4 Stacking Faults 412
8.4.1 Basal Stacking Faults 412
8.4.2 Prismatic Stacking Faults 415
8.4.2.1 Morphology of the {1120} Stacking Faults Inside
the Epitaxial Layers 415
8.4.2.2 Identification of the Stacking Fault Atomic Structure 416
8.4.2.3 Formation Mechanisms 419
A. On (0001) 6H-SiC Surface 419
B. On (0001) Sapphire 420
8.4.2.4 Relative Stability of the Atomic Configurations 421
8.5 Inversion Domain Boundaries 422
8.5.1 Identification of the Inversion Domains 423
8.5.2 Atomic Models of the Boundary 425
8.5.3 Atomic Structures of the Boundary 426
Contents XIII
8.5.4 Atomic Structure of Boundary Plane
and Epitaxial Layer Morphology 429
8.5.5 Interaction with Basal Stacking Faults 430
8.5.6 Formation 432
8.6 Discussion and Conclusions 433
8.7 Acknowledgments 436
8.8 References 436
9 Strain, Chemical Composition, and Defects Analysis
at Atomic Level in GaN-based Epitaxial Layers 439
Slawomir Kret, Pierre Ruterana, Claude Delamarre, Tarek Benabbas,
and Pawel Dluzewski
9.1 Introduction 439
9.2 Suitable Images for Quantitative Analysis 442
9.3 Digitization 444
9.4 Noise 446
9.5 Strain Measurement 451
9.5.1 Domain of Application 451
9.5.2 Assumptions 451
9.5.3 Peak-finding Procedure 452
9.5.3.1 Overview 452
9.5.3.2 Procedure 453
A. Selection of Area of Interest 453
B. Noise Reduction 453
C. Detection of the Lattice Sites 455
D. Reference Area and Calculation of the Base Vectors 456
E. Lattice Distortion in Discrete and Quasicontinuum Form 456
9.5.4 The Geometric-Phase Method 460
9.5.5 Peak Finding Versus Geometric Phase 466
9.6 Foil-Thickness Effect 467
9.7 From Strain to Stress 472
9.8 Local Chemical Composition 475
9.9 Atomic-Structure Retrieval 478
9.9.1 Artefact-free Sample and Signal-to-Noise Ratio 479
9.9.2 Defect-Structure Determination Strategies 480
9.9.3 Preprocessing of Image Data and Image Simulations 480
9.9.4 Quality Functions (Goodness-of-Fit Criteria) 481
9.9.5 Determination of the Imaging Parameters 481
9.9.6 Optimization Strategies 482
9.9.7 Precision of the Structure Retrieval 482
9.10 Discussion and Conclusions 483
9.11 Acknowledgments 484
9.12 References 485
XIV Contents
Part 3 Processing and Devices 489
10 Ohmic Contacts to GaN 491
Philip J. Hartlieb, Robert F. Davis, and Robert J. Nemanich
10.1 Introduction 492
10.2 Principles of Metal-Semiconductor Contacts 493
10.3 Measurement Techniques 496
10.4 Experimental Studies of Ohmic Contacts to n-Type GaN 497
10.5 Experimental Studies of Ohmic Contacts to p-Type GaN 507
10.6 Conclusions 522
10.7 Directions for Future Research 522
10.8 Acknowledgments 523
10.9 References 524
11 Electroluminescent Diodes and Laser Diodes 529
Hiroshi Amano
11.1 Introduction 529
11.2 Historical Overview 530
11.3 White LEDs 534
11.4 UV LEDs 536
11.5 Violet LDs 541
11.6 Summary 542
11.7 Acknowledgments 544
11.8 References 544
12 GaN-Based Modulation-Doped FETs and Heterojunction
Bipolar Transistors 547
Hadis Morkoç and Lianghong Liu
12.1 Introduction 548
12.2 Electron Transport Properties in GaN
and GaN/AIGaN Heterostructures 550
12.2.1 Bulk Mobility in GaN 552
12.2.2 Polarization Effects, Mobility and Electron Concentration
in 2 DEG Systems 556
12.2.3 Partial Strain Relaxation 567
12.2.4 Low-field Transport in 2 DEG Systems 570
12.2.5 High-Field Transport 574
12.3 Modulation-Doped Field Effect Transistors (MODFETs) 576
12.3.1 MODFET Model 577
12.3.1.1 Drain Current Model in MODFETs 583
12.3.1.2 I–V Characteristics 585
12.3.2 Experimental Considerations 586
12.3.3 Schottky Barriers for Gates 589
12.3.4 Contacts to GaN 592
12.3.5 Experimental Performance of GaN MODFETs 594
Contents XV
12.3.6 Power Amplifiers 601
12.3.7 Anomalies in GaN/AlGaN MODFETs 603
12.3.8 Low-Frequency and High-Frequency Noise Performance 608
12.3.8.1 Low-Frequency Noise 608
12.3.8.2 High-Frequency Noise 611
12.4 Heterojunction Bipolar Transistors 614
12.5 Conclusions 617
12.6 Acknowledgments 618
12.7 References 619
13 GaN-Based UV Photodetectors 627
Franck Omnes and Eva Monroy
13.1 Introduction 627
13.2 UV to Visible Contrast 631
13.3 Si and SiC UV Photodetectors 632
13.3.1 Silicon-Based UV Photodiodes 632
13.3.2 SiC-Based UV Photodetectors 634
13.4 III-Nitride-Based UV Photodetectors 635
13.4.1 Photoconductors 635
13.4.1.1 Spectral Response 635
13.4.1.2 Time Response 639
13.4.1.3 Effect of a Frequency Modulation of the Incident Optical Signal 640
13.4.2 AlGaN-Based Schottky Barrier Photodiodes 641
13.4.2.1 Electrical Properties 641
13.4.2.2 Responsivity 642
13.4.2.3 Time Response 643
13.4.2.4 Noise and Detectivity 644
13.4.2.5 Epitaxial Lateral Overgrown (ELOG)
GaN-Based Schottky Barrier Photodiodes 645
13.4.2.6 Application of AlGaN Photodetectors to the Simulation
of the Biological Effects of UV Light 645
13.4.3 Metal-Semiconductor-Metal (MSM) Photodiodes 646
13.4.3.1 Electrical Properties 647
13.4.3.2 Spectral Response 648
13.4.3.3 Time Response 649
13.4.3.4 Noise 650
13.4.4 p-n and p-i-n Photodiodes 650
13.4.4.1 Spectral Response 651
13.4.4.2 Time Response 652
13.4.4.3 Noise 653
13.4.4.4 p-i-n Photodiodes on ELOG GaN 653
13.4.4.5 GaN-Based Avalanche Photodiodes 654
13.4.5 Phototransistors 655
13.4.5.1 Bipolar Phototransitors 655
13.4.5.2 Field Effect Phototransistors 656
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